Frustrated by ill-fitting rack clothing found in department stores, founder Susan Spencer immersed herself in identifying the source of fashion’s poor-fit problem. A systems analyst by trade, Susan began by doing what she does best: analyzing data. She studied over 150 pattern-making software programs, each yielding poor outcomes. It was there she discovered the root of the industry’s issue: all the pattern-making software programs adopted by the industry were developed based on Victorian-era design measurements. No program offered the ability to tailor measurements to allow designers to efficiently scale their design patterns to meet the fit of today’s population.
This passion led to the development of Seamly 2D: an open-source fashion design program that allows fashion design agencies of all sizes across the globe to profitably create their design patterns quickly and easily. To date, over 30,000 designers in over 35 different countries have transformed the way they do business as a result of this groundbreaking technology.
Whether you are designing physical fashion pieces or designing for the emerging digital fashion space, our tools are designed for you.
Multiple industries can benefit from Seamly’s advanced design, production, and publication features. Seamly’s single solution end-to-end workflow can create custom-sized and special-sized digital clothing for use in film, gaming, animation, and online sales. Changes made in the digital prototyping environment auto-populate to production patterns, online catalogs, and asset libraries. And as a bonus, we provide a highly creative and enjoyable user experience unlike anything available on the market.